kerimistry
LOCATION:
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Kerim M. Gattás Asfura, Ph.D.
Chemist.
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August 21, 2018

Surface film thickness of NaOH-treated and silanized silicon wafers

Kerim M. Gattás-Asfura

Biosci. Chem. 2015 vol. 2, p. 1

Silicon wafer, Ellipsometer, Silanization, NaOH, KerimistryHot sodium hydroxide solution etched the polished surface of silicon wafers as measured by ellipsometry. Subsequent silanization of such etched surface utilizing 11-bromoundecyltrichlorosilane increased film thickness on the wafers. Further treatment with sodium azide for azide substitution of the bromo end group did not significantly change the surface film thickness.

Research Note (PDF)

 


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